1. KRISHNAPRASATH RAMAKRISHNASUBRAMANIAN
Information acquired: 2025
KRISHNAPRASATH RAMAKRISHNASUBRAMANIAN is an academic who published a paper in 2016 entitled REACTION NETWORK ANALYSIS FOR THIN FILM DEPOSITION PROCESSES. KRISHNAPRASATH RAMAKRISHNASUBRAMANIAN published this work as part of a team: Ramakrishnasubramanian, Krishnaprasath. Here is a description of this work: Understanding the growth of thin films produced by Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) has been one of the most important challenge for surface chemists over the last two to three decades. There has been a lack of complete understanding of the surface chemistry behind these systems due to the dearth of experimental reaction kinetics data available. The data that do exist are generally derived through quantum computations. Thus, it becomes ever so important to develop a deposition model which not only predicts the bulk film chemistry but also explains its self-limiting nature and growth surface stability without the use of reaction rate data. n nThe reaction network analysis tools developed in this thesis are based on a reaction factorization approach that aims to decouple the reaction rates by acc.